Amanda Hoskins
PhD Candidate
Atomic Layer Deposition

Department of Chemical and Biological Engineering; Office D1B70
University of Colorado
3415 Colorado Avenue, 80303
JSCBB Campus Box 596 UCB
鈥婤oulder, CO 80309-0596

Education

  • B.S., Chemical Engineering, Rochester Institute of Technology
  • M.S., Chemical Engineering, 精品SM在线影片

Amanda graduated from Rochester Institute of Technology with her B.S. in Chemical Engineering in May 2014. She has worked as a co-op for Bristol-Myers Squibb and Xerox as well as more than 3 years of research during her undergraduate career. She is currently pursuing a PhD in Chemical Engineering and joined Team Weimer in the fall of 2014. Her research focuses on the use of atomic layer deposition as a method to form nano-structured听ceramic coatings for high temperature stabilization of materials. She uses a combined computational and experimental approach to fully understand and synthesize containment materials for high temperature solar-thermal water splitting.